Double patterning (DP), as the simplest form of multi-patterning techniques, is receiving lots of attention right now. The need for double patterning techniques is driven by the physical limits of the ...
MONTEREY, Calif. — ASML Holding NV has quietly inserted 193-nm immersion with double-patterning techniques on its roadmap, claiming that the technology is the “only” lithographic solution for the ...
SAN JOSE, Calif. “- At the SPIE Advanced Lithography conference here, Nikon Corp. outlined its product roadmap that includes a pair of tools for double-patterning applications. Nikon (Tokyo) also ...
Just mention double patterning (DP) to designers, and you can see the fear in their eyes. There is real trepidation about what kind of monster DP design debugging will be. In this article, I hope to ...
Extreme UV lithography (EUVL) and 193 nm immersion lithography enhanced by double-patterning techniques will be sufficient to maintain the lithography roadmap for several technology nodes. That was ...
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