Optical characterisation of thin films is a critical field that bridges fundamental research and application in materials science and engineering. It encompasses the use of various spectroscopic ...

Ellipsometry is a total optical measurement technique. This method is employed to measure how the polarization of light changes when passing through a medium. The polarized light shows distortion ...

The applications of spectroscopic ellipsometry for the precise characterization of liquid-liquid and liquid-air interfaces include surface science, biomedical applications, thin film coatings, and ...

Artificial intelligence is one of the driving forces in today’s semiconductor industry, with more traditional market drivers like high performance compute and smart phones continuing to play important ...

Ellipsometry is a non-destructive, optical measurement technique that characterizes the optical properties of thin films. It is highly sensitive to changes in the thickness and refractive index of the ...

Semiconductor devices are becoming thinner and more complex, making thin deposited films even harder to measure and control. With 3nm node devices in production and 2nm nodes ramping toward ...

Spectroscopic ellipsometry based on photoelastic modulation delivers very high accuracy and repeatability. Owing to this technology the UVISEL allows the unique combination of high performance and ...