A new ultraviolet laser source pushes maskless lithography closer to mainstream use in advanced semiconductor packaging by ...
Canon launched its Nanoimprint Lithography semiconductor manufacturing equipment, which has the potential to compete with ASML's EUV technology currently in production at 4nm. Canon's first planned ...
The development of nanoelectronics has enabled operations at the nanoscale, resulting in the creation of smaller and more efficient electronic devices. Here, we offer a comprehensive summary of the ...
M. K. Sears, J. Bekaert, B. W. Smith, "Pupil wavefront manipulation for optical nanolithography", Proc. SPIE 8326, (2012) paper M. K. Sears, G. Fenger, J. Mailfert, B ...
Photronics Inc. today announced its Sub-Wavelength Reticle Solutions phase shift photomasks have been used to demonstrate the production of sub-100nm features using KrF (248nm) exposure technology.
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