Number of applications for technology increase, and so do the number of companies vying for a piece of the growing market. Amid the shift to 3D NAND, finFETs and other device architectures, the atomic ...
With each transition to a new technology node, fab requirements for metal and particle contamination become more stringent, posing challenges for existing coating methods such as anodization or plasma ...
ALD is based on the sequential use of a gas phase chemical process. The ALD cycle consists of four main steps: (1) pulsing of a precursor A, (2) purging of the reactor to remove excess precursor and ...
Making films one molecular layer at a time might seem like painstaking work limited to laboratories researching esoteric surface science. But it’s not. Atomic layer deposition (ALD), a layer-at-a-time ...
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