(Nanowerk News) Toshiba Corporation and the National Institute of Advanced Industrial Science and Technology (AIST) today announced joint development of a mask pattern optimizing technology that ...

Given that the alternatives all have challenges, it looks to me that optical lithography will have to deliver the 16 nm and most likely the 11 nm node. In my last blog, I reviewed the news from SPIE’s ...

In a recent study published in Science, a group of Researchers at the University of Chicago, in collaboration with the Argonne National laboratory, have recently developed a novel method they termed ...

In the fifty years since Richard Feynman's eloquent assertion that there is Plenty of Room at the Bottom the world of nano-engineering has matured so that sophisticated systems can now be manufactured ...

The process starts with the substrate being coated with a light-sensitive photoresist. A photomask, which contains the desired pattern, is then aligned above the substrate. Ultraviolet (UV) light is ...

IBM develops an optical lithography technique capable of producing structures less than 32 nm in size which its says gives the industry seven years of breathing space. Scientists at IBM say they have ...