Electronic Design

Optical Proximity Correction Spreads Its Wings Across The Process Window

Variability in lithography processes can have a profound effect on IC yield, particularly at 90 and 65 nm. Process variability can destroy image fidelity even when the operating conditions of the ...
Electronic Design

OPC Tool Spurred By Cell-Processor-Based Hardware

The next generation of Mentor Graphics' optical-proximity correction (OPC) tool has arrived, bringing with it a number of innovations that result in improved simulation accuracy. The next generation ...
EDN

Renesas licenses Synopsys’ OPC software for 28nm node

PARIS — Japan's Renesas Technology Corp. announced it has selected Synopsys' Proteus optical proximity correction (OPC) software for 28nm development. By utilizing Synopsys' Proteus, Renesas said it ...
The National Law Review

Silvaco Expands Product Offering with Acquisition of Cadence’s Process Proximity Compensation Product Line

SANTA CLARA, Calif., March 04, 2025 (GLOBE NEWSWIRE) -- Silvaco Group, Inc. (Nasdaq: SVCO) (“Silvaco” or the “Company”), a provider of TCAD, EDA software and SIP solutions that enable semiconductor ...
EDN

OPC tool aims to cut IC manufacturing time

SANTA CRUZ, Calif. — Promising to eliminate weeks or months spent rerunning optical proximity correction on IC layouts, startup Aprio Technologies Inc. will introduce its first product this week — a ...
Nanowerk

Enhancing nanolithography fidelity through near-field optical proximity correction

(Nanowerk News) Led by Prof. Wei Yayi, a team of researchers from the University of Chinese Academy of Sciences (UCAS) has achieved a significant breakthrough in enhancing the final pattern fidelity ...
Morningstar

Silvaco Expands Product Offering with Acquisition of Cadence’s Process Proximity Compensation Product Line

The addition of the PPC product line - an optical proximity correction (“OPC”) suite of tools highly complementary to Silvaco’s EDA and TCAD suite, along with its cutting-edge technology and talented ...