SANTA CLARA, Calif.--(BUSINESS WIRE)--Applied Materials, Inc. today broadened its portfolio of advanced patterning solutions with the launch of its Applied Producer ® ACE ™ SACVD ® (1) system. Helping ...
According to Applied Materials, it is. As 32 nm technologies ramp within the next two years, the extension of optical lithography to meet patterning requirements is the industry’s most urgent ...
SAN JOSE, Calif. — For next-generation memory production, 193-nm lithography with self-aligned double-patterning (SADP) are the technology of choices over rival schemes, according to an analyst.
Self-Aligned Double Patterning (SADP) may be the most cost-effective answer to production tools for the 32nm process node and for continued scaling down to the 22nm node, according to a statement from ...
FREMONT, CA--(Marketwired - July 13, 2015) - Lam Research Corp. (LRCX), a major global supplier of innovative wafer fabrication equipment and services to the semiconductor industry, today announced it ...
SANTA CLARA, Calif., July 20 (UPI) -- Santa Clara, Calif.-based Applied Materials Inc. has broadened its portfolio of advanced patterning solutions. The nanomanufacturer of solar technologies launched ...
Double patterning looks like being the lithography tool of choice at 32nm, but how do you absorb the inevitable extra costs of a double lithography process? According to Applied Materials, the world’s ...
In recent years a strong demand has arisen for spin-on carbon (SOC) materials compatible with high-temperature processes. This requirement is to enable usage of high ...
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