(Nanowerk News) Toshiba Corporation and the National Institute of Advanced Industrial Science and Technology (AIST) today announced joint development of a mask pattern optimizing technology that ...

What Is Electron Beam Lithography? Electron beam lithography (EBL) is a technique for creating high-resolution patterns on a semiconductor substrate by directing a beam of electrons to selectively ...

10nm pattern generation using thermal scanning probe lithography enabled by simplified materials and processes Thermal scanning probe lithography (tSPL) has been used to create patterns with sub-20 nm ...

New type of EUV lithography using only four reflective mirrors overturns conventional technology and will contribute to advanced semiconductors at 7nm and below Okinawa Institute of Science and ...

TSMC is planning to adopt double patterning extensively at 20nm, despite the high cost of doing so. Why? Because EUV hasn't come through. Share on Facebook (opens in a new window) Share on X (opens in ...

In lithography, pushing the limits of resolution is what we do. These efforts tend to get a lot of press. After all, the IC technology nodes are named after the smallest nominal dimensions printed ...

The growing demand for heterogeneous integration is driven by the 5G market. This includes smartphones, data centers, servers, high-performance computing (HPC), artificial intelligence (AI) and ...

As semiconductor technology advanced from 65nm to 7nm over the last 10 years, new challenges have arisen in design and manufacturing. Securing the IC yield means developing new methods that respond to ...

Canon expects its nanoimprint lithography machine to ship this year, competing with ASML's EVU gear as economies around the world are keen to expand their chip production capacity on their home turfs, ...