ASML Developing Next-Gen EUV Lithography
ASML Developing Next-Gen EUV Lithography
Dec 5, 2018
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ASML Uncovers Plans for Next-Generation Hyper-NA Extreme Ultraviolet Lithography
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Intel shares biggest unboxing video ever as ASML’s $380 million High-NA lithography machine is installed in Oregon fab
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7.8K views · 172 reactions | What role does the reticle stage play in High NA extreme ultraviolet (EUV) lithography? In this video, learn how the reticle stage enables patterning in advanced chipmaking. You’ll see how 13.5 nanometer EUV light reflected into the system gets shaped by the illuminator and how a chip pattern gets encoded into the light for lithography. | ASML | Facebook
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